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Last Updated: 2024-12-03 (yyyy-mm-dd).

Title: 4 a plasma Technology and Power Supplies for thin filmapplications DC dc pulse pulsed dc power supply magnetron dual singleplanar rotatable sputter sputtering thin thilm deposition source hipimstechnology deposition unipolar bipolar coating arc pulsed arc frequencyimpuls dünnfilm prozess pvd pecvd production mf stromversorgungabeg engineering

Description: 4 a plasma Technology and Power Supplies for thin film applications DC dc pulse pulsed dc power supply magnetron dual single planar rotatable sputter sputtering thin thilm deposition source hipims technology deposition unipolar bipolar coating arc pulsed arc frequency impuls dünnfilm prozess pvd pecvd production mf stromversorgung abeg engineering

Language: English

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